Macroscale Transformation Optics Enabled by Photoelectrochemical Etching.
نویسندگان
چکیده
Photoelectrochemical etching of silicon can be used to form lateral refractive index gradients for transformation optical devices. This technique allows the fabrication of macroscale devices with large refractive index gradients. Patterned porous layers can also be lifted from the substrate and transferred to other materials, creating more possibilities for novel devices.
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عنوان ژورنال:
- Advanced materials
دوره 27 40 شماره
صفحات -
تاریخ انتشار 2015